· 离子溅射二硫化钼：

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· CrN coatingProperties of coating: typical thickness 2.0-3.0μm; friction coefficient between £ 0.15 (typically 0.05 and 0.10) against WC/Co ball; hardness H Plast. ³1200kg/mm², dark grey in colour; wear rate(SWR): 2.0E-16m3/Nm（WC-6%Co ball Ø5mm, 80N test, Ø8mm track, 477rpm, 30mins)

镀层的性质：一般厚度大约2.0-3.0 μm；摩擦系数小于 0.15。（典型为：0.05-0.10间）(against WC/Co ball)；硬度Hp > 1,200kg/mm² ；深灰黑色；划痕粘接力：大于60N；相对磨损率：2E-16  m3/Nm (WC-6%Co ball Ø5mm, 80 N test    Ø8mm track, 477rpm, 200mms-1)。

· MoS2基镀层一般厚度大于1.0 μm；摩擦系数约为0.05 到 0.10之间(against WC/Co ball)；在150kgf的洛氏硬度计压头压入，镀层不脱落（>HF2），硬度约 950-1050 VHN；深灰色；划痕粘接力：大于60N；相对磨损率：2E-16  m3/Nm (WC-6%Co ball Ø5mm, 40 N test    Ø8mm track, 477rpm, 200mms-1)。

· •MoST : Properties of coating

CrN 镀层

CrN: 镀层硬度Hf>2000HV，镀层厚度>3微米；结合力：在150kgf的洛氏硬度计压头压入，镀层不脱落（>HF2）； 标准划痕试验：Lc>60N；镀层前后的表面粗糙度增加值Ra≤0.01微米，镜面效果。

CrN coating, the hardness of the coating: Hf>2000Hv, the thickness of the coatings: >3.0um. The adhesion of the coatings: >HF2. And Lc > 60N with Scratch system. The Roughness of the coating Ra<0.01 

性能优势

· Coating deposition carried out using a high density of low energy bombarding ions.

使用高密度低能量轰击离子进行沉积镀膜。

· Deposition of very dense, non-columnar coating structures with low internal stresses.

镀层致密度好，低柱状晶结构，内应力低

· Deposition of coatings with dense structures at low temperatures.

• 可在低温环境下沉积致密结构的镀层

· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

高效率等离子清理以提供高的镀层结合强度。

· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.

镀层品质保证是由使用专门设计plasmag溅射源及提供高密度的等离子。   

离子溅射二硫化钼，真空镀二硫化钼，PVD二硫化钼，离子束溅射MoS2，耐高温：350度，